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ASML ready to start shipping 65nm instruments next year
The future 2021 should be the year of intensive implementation of 90nm technological standards. However, ASML is already announcing the completion of the development of the Twinscan XT: 1250 lithographic tool capable of operating at 65nm standards. Twinscan XT: 1250 Deliveries Commence March-April 2021.
The Twinscan XT: 1250 uses a 193 nm light source and is broadly the same as the previous version of the Twinscan AT: 1200, but with improved optics and improved software to accommodate more factors. Twinscan AT: 1200 is capable of creating geometrical sizes from 80 nm on 300 mm wafers, XT: 1250 – from 70 nm on 200 and 300 mm wafers. The last circumstance – the ability to work with 200 mm inserts, adds to the market attractiveness of the tool.
Also reduced power consumption and dimensions ? XT: 1250 takes up 25% less space and uses less power and water. The processing speed of the wafers is approximately 114 per hour. True, the cost of the device will be about $ 20 million.